CARBURIZATION APPARATUS AND CARBURIZATION METHOD

• Main Authors: INOGUCHI GENKI, HATTA MASAYOSHI, FUKUCHI SHINYA, MORIMOTO TAKASHI, SASAMOTO MITSUHIRO, KABASAWA HITOSHI, OKUMURA NOZOMI
• Format: Patent
• Language: English; Japanese
• Published: 21.01.2022
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To provide a carburization apparatus and a carburization method, capable of carburizing quickly by suppressing sooting furthermore.SOLUTION: A carburization apparatus includes a treatment furnace 10 for storing a workpiece, a heating part 11 for heating the treatment furnace, a gas supply part 20 for supplying carrier gas and acetylene into the treatment furnace, an ion attachment mass spectroscope 40 connected to the treatment furnace, for detecting an acetylene concentration in emission gas from the treatment furnace, and a control part 50 for controlling a supply amount of acetylene into the treatment furnace based on the acetylene concentration.SELECTED DRAWING: Figure 1 【課題】スーティングをさらに抑制し、迅速に浸炭が可能な浸炭装置および浸炭方法を提供する。【解決手段】本発明の浸炭装置は、ワークを収容する処理炉１０と、前記処理炉を加熱する加熱部１１と、前記処理炉内にキャリアガスとアセチレンを供給するガス供給部２０と、前記処理炉に接続され、前記処理炉からの排出ガス中のアセチレン濃度を検出するイオン付着質量分析装置４０と、前記アセチレン濃度に基づいて、前記処理炉内へのアセチレンの供給量を制御する、制御部５０と、を備えている。【選択図】図１