QUANTUM DEVICE AND MANUFACTURING METHOD THEREOF
To provide a quantum device and a manufacturing method thereof that can improve the quality (quantum coherence, etc.).SOLUTION: A quantum device 100 includes an interposer 112, a quantum chip 111, a first connection unit 130 that is provided between the interposer 112 and the quantum chip 111 and el...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English Japanese |
Published |
17.01.2022
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a quantum device and a manufacturing method thereof that can improve the quality (quantum coherence, etc.).SOLUTION: A quantum device 100 includes an interposer 112, a quantum chip 111, a first connection unit 130 that is provided between the interposer 112 and the quantum chip 111 and electrically connects a wiring layer of the interposer 112 and a wiring layer of the quantum chip 111, a predetermined signal line w1 arranged in the wiring layer of the quantum chip 111, first shielded wiring w1 arranged along the predetermined signal line w1 on the wiring layer of the quantum chip 111, second shield wiring w2 arranged in the wiring layer of the interposer 112, and a second connection unit 150 provided between the interposer 112 and the quantum chip 111 and in contact with the first shield wiring w1 and the second shield wiring w2.SELECTED DRAWING: Figure 1
【課題】品質(量子コヒーレンスなど)を向上させることが可能な量子デバイス及びその製造方法を提供すること。【解決手段】量子デバイス100は、インターポーザ112と、量子チップ111と、インターポーザ112と量子チップ111との間に設けられ、インターポーザ112の配線層と量子チップ111の配線層とを電気的に接続する第1接続部130と、量子チップ111の配線層に配置された所定の信号線w1と、量子チップ111の配線層に、所定の信号線w1に沿って配置された第1シールド配線w1と、インターポーザ112の配線層に配置された第2シールド配線w2と、インターポーザ112と量子チップ111との間に設けられ、第1シールド配線w1及び第2シールド配線w2に接するように設けられた第2接続部150と、を備える。【選択図】図1 |
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Bibliography: | Application Number: JP20200111953 |