PHOTOCURABLE COMPOSITION AND PATTERN FORMATION METHOD

• Main Authors: KONNO TAKEMASA, HIRANO ISAO
• Format: Patent
• Language: English; Japanese
• Published: 27.12.2021
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; BASIC ELECTRIC ELEMENTS; CHEMISTRY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; PERFORMING OPERATIONS; SEMICONDUCTOR DEVICES; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; THEIR PREPARATION OR CHEMICAL WORKING-UP; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

To provide a photocurable composition and a pattern formation method, which enable the achievement of satisfactory adhesion to a substrate.SOLUTION: A photocurable composition for optical imprint lithography comprises (A) a carboxy group-containing (meth)acrylate, (B) an acid anhydride, (C) a photopolymerizable monomer having two or more polymerizable functional groups, and (D) a photopolymerization initiator.SELECTED DRAWING: None 【課題】基板への密着性が良好な光硬化性組成物、及びパターン形成方法を提供する。【解決手段】（Ａ）成分：カルボキシ基含有（メタ）アクリレートと、（Ｂ）成分：酸無水物と、（Ｃ）成分：２つ以上の重合性官能基を有する光重合性モノマー、（Ｄ）成分：光重合開始剤と、を含有する光インプリントリソグラフィ用光硬化性組成物。【選択図】なし