IMPRINT METHOD, IMPRINT DEVICE, AND METHOD FOR MANUFACTURING ARTICLE

• Main Authors: KAWASAKI YOJI, SAITO ARIHIRO
• Format: Patent
• Language: English; Japanese
• Published: 25.11.2021
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; SEMICONDUCTOR DEVICES; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

To provide a technique advantageous for making uniform the size of droplets of imprint material arranged on a substrate.SOLUTION: An imprint method is for forming a pattern of imprint material on a substrate by using a mold, and the imprint method includes: a first step of having a function to allow...