IMPRINT METHOD, IMPRINT DEVICE, AND METHOD FOR MANUFACTURING ARTICLE

• Main Authors: KAWASAKI YOJI, SAITO ARIHIRO
• Format: Patent
• Language: English; Japanese
• Published: 25.11.2021
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; SEMICONDUCTOR DEVICES; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

To provide a technique advantageous for making uniform the size of droplets of imprint material arranged on a substrate.SOLUTION: An imprint method is for forming a pattern of imprint material on a substrate by using a mold, and the imprint method includes: a first step of having a function to allow the substrate and the imprint material to be closely adhered to each other, and forming, on the substrate, a film for increasing a liquid repellent property against the imprint material through irradiation with first light; a second step of, after the first step, irradiating the film formed on the substrate with the first light so as to reduce a difference in size of droplets of the imprint material that are generated by the film being irradiated with second light for curing the imprint material and arranged at a plurality of positions on the substrate; and a third step of, after the second step, arranging the droplets of the imprint material on the film and irradiating the droplets with the second light while bringing the imprint material and the mold into contact with each other to form the pattern.SELECTED DRAWING: Figure 7 【課題】基板上に配置されるインプリント材の液滴の大きさを均一にするのに有利な技術を提供する。【解決手段】型を用いて基板上にインプリント材のパターンを形成するインプリント方法であって、前記基板と前記インプリント材とを密着させる機能を有し、第１光の照射により前記インプリント材に対する撥液性が増加する膜を前記基板上に形成する第１工程と、前記第１工程の後、前記膜に前記インプリント材を硬化させる第２光が照射されることで生じる、前記基板上の複数の位置のそれぞれに配置される前記インプリント材の液滴のサイズの差が低減するように、前記第１光を前記基板上に形成された前記膜に照射する第２工程と、前記第２工程の後、前記膜の上に前記インプリント材の液滴を配置し、当該インプリント材の液滴と前記型とを接触させた状態で前記第２光を照射することで前記パターンを形成する第３工程と、を有することを特徴とするインプリント方法を提供する。【選択図】図７