SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSING METHOD

• Main Authors: TANAKA AKIYOSHI, MIYAMOTO ISATAKE, OGATA NOBUHIRO, NAKAJIMA MIKIO
• Format: Patent
• Language: English; Japanese
• Published: 25.11.2021
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

To provide an advantageous technology for detecting occurrence of a fault such as leakage of a processing liquid.SOLUTION: A substrate liquid processing apparatus comprises: a liquid piping in which a processing liquid is flowed; a discharge nozzle that discharges the processing liquid supplied through the liquid piping; a valve mechanism that adjusts a flow of the processing liquid in the liquid piping; and a liquid detection sensor that detects existence/non-existence of the processing liquid in the liquid piping. In a state where the valve mechanism operates such that the processing liquid in the liquid piping is positioned upstream of a first piping measurement site of the liquid piping, the liquid detection sensor detects existence/non-existence of the processing liquid in the first piping measurement site which is positioned at a first measurement point.SELECTED DRAWING: Figure 4 【課題】処理液のリーク等の不良の発生を検出するのに有利な技術を提供する。【解決手段】基板液処理装置は、処理液が流される液配管と、液配管を介して供給される処理液を吐出する吐出ノズルと、液配管における処理液の流れを調整する弁機構と、液配管における処理液の有無を検知する液検知センサーとを備える。液配管における処理液を液配管の第１配管計測部位よりも上流に位置させるように弁機構が動作している状態で、液検知センサーは、第１測定ポイントに位置する第１配管計測部位における処理液の有無を検知する。【選択図】図４