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To provide a method of fabricating a light emitting device which withstands a process temperature of 500°C or higher, and uses flexible glass, and the light emitting device.SOLUTION: An adsorption layer is used to stick a second substrate on a support substrate. On a surface of the second substrate,...

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Bibliographic Details
Main Author HIRAKATA YOSHIHARU
Format Patent
LanguageEnglish
Japanese
Published 25.11.2021
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Summary:To provide a method of fabricating a light emitting device which withstands a process temperature of 500°C or higher, and uses flexible glass, and the light emitting device.SOLUTION: An adsorption layer is used to stick a second substrate on a support substrate. On a surface of the second substrate, an electrode for a touch panel is formed of a transparent conductive film. The second substrate is bonded to a back plane substrate where transistors and light emitting elements are formed. The back plane substrate has a peeling layer and a buffer layer, a first substrate is separated from the back plane substrate by peeling the peeling layer from the buffer layer, and a second adhesion layer is used to bond a flexible third substrate to a surface of the buffer layer which is exposed as a result of the separation. The second substrate and adsorption layer are peeled from each other to separate the support substrate from the second substrate.SELECTED DRAWING: Figure 7 【課題】500℃以上の工程温度に耐えうる、可撓性ガラスを用いた発光装置の作製方法と、その発光装置を提供する。【解決手段】第2基板を吸着層を用いて支持基板に貼り付ける。その第2基板の表面に透明導電膜でタッチパネル用の電極を形成する。その第2基板をトランジスタと発光素子を形成したバックプレーン基板に接着する。バックプレーン基板は剥離層とバッファ層を有しており、剥離層とバッファ層との間で剥離することによってバックプレーン基板から第1基板を分離し、分離によって露出したバッファ層の表面に、第2接着層を用いて可撓性の第3基板を接着する。第2基板と吸着層との間で剥離することによって第2基板から支持基板を分離する。【選択図】図7
Bibliography:Application Number: JP20210125417