RESIN COMPOSITION

• Main Authors: SHIMIZU TAKASHI, SUZUKI KYOICHI
• Format: Patent
• Language: English; Japanese
• Published: 18.11.2021
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMISTRY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

To provide a resin composition capable of offering ultraviolet laser processing resist which makes it possible to carry out highly accurate processing.SOLUTION: A resin composition for ultraviolet laser processing resist contains a copolymer including a first block having a polysilane skeleton and a second block that is a polymer of vinyl monomer. The second block includes a monomer unit derived from ultraviolet absorbing monomer having ultraviolet absorbing action.SELECTED DRAWING: None 【課題】高精度の加工が可能な紫外線レーザ加工レジストを実現できる樹脂組成物を提供する。【解決手段】ポリシラン骨格を有する第１のブロックと、ビニルモノマーの重合体である第２のブロックとを有する共重合体を含有する紫外線レーザ加工レジスト用の樹脂組成物であり、第２のブロックは、紫外線吸収作用を有する紫外線吸収性モノマーに由来するモノマー単位を含む。【選択図】なし