COATING FILM DRYING APPARATUS AND DRYING METHOD

To provide a drying apparatus and a drying method which can suppress fluctuation in drying a coating film with a simple mechanism.SOLUTION: The present invention is directed to a drying apparatus for drying a coating film on a substrate conveyed in a predetermined conveyance direction. The drying ap...

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Bibliographic Details
Main Authors ARAYA YUSUKE, HASEGAWA TOSHIYA, TOGASHI YUDAI, UEJUKKOKU KAZUYA
Format Patent
LanguageEnglish
Japanese
Published 01.11.2021
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Summary:To provide a drying apparatus and a drying method which can suppress fluctuation in drying a coating film with a simple mechanism.SOLUTION: The present invention is directed to a drying apparatus for drying a coating film on a substrate conveyed in a predetermined conveyance direction. The drying apparatus has a plurality of drying furnaces disposed along the conveyance direction for drying a coating film by heating the substrate passing inside the furnaces, an inlet of the drying furnace disposed at the most upper stream side in the conveyance direction, and a plurality of blowing units disposed in the vicinity of a connection part of the adjacent drying furnace for making wind blowing in the conveyance direction of the substrate. Wind velocity of air stream generated by the blowing unit is 0.3 through 1.0 m/s.SELECTED DRAWING: Figure 1 【課題】簡易な機構によって塗布膜の乾燥ムラを抑制できる乾燥装置及び乾燥方法を提供する。【解決手段】所定の搬送方向に搬送される基材上の塗布膜を乾燥させる乾燥装置であって、搬送方向に沿って配置され、内部を通過する基材を加熱することにより塗布膜を乾燥させる複数の乾燥炉と、搬送方向の最上流に配置される乾燥炉の入口と、隣接する乾燥炉の接続部近傍とに配置され、基材の搬送方向に送風を行う複数の送風ユニットとを備え、送風ユニットが発生させる空気流の風速が0.3〜1.0m/sである、乾燥装置。【選択図】図1
Bibliography:Application Number: JP20200076926