ANTI-POLLUTION SKIN CARE MATRIX, PREPARATION METHOD AND USE THEREFOR, AND COSMETICS
To provide an anti-pollution skin care matrix, a preparation method and use therefor, and cosmetics in the technical field of cosmetics.SOLUTION: An anti-pollution skin care matrix comprises a moisturizer and an anti-pollution agent. The anti-pollution agent includes Depollutine, Ciste'M, Herba...
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Main Authors | , , , , , , , |
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Format | Patent |
Language | English Japanese |
Published |
01.11.2021
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Subjects | |
Online Access | Get full text |
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Summary: | To provide an anti-pollution skin care matrix, a preparation method and use therefor, and cosmetics in the technical field of cosmetics.SOLUTION: An anti-pollution skin care matrix comprises a moisturizer and an anti-pollution agent. The anti-pollution agent includes Depollutine, Ciste'M, HerbaShield URB, "WA ism" <Uji tea> and Ectoin. The anti-pollution skin care matrix can protect the skin from various pollutions, reduce the adsorption of pollutants to the skin, avoid damages by pollutants to the skin, reduce allergic symptoms of the skin, clean the skin, and delay skin aging.SELECTED DRAWING: None
【課題】化粧品の技術分野に関し、汚染防止スキンケアマトリックス、その調製方法及び使用、並びに化粧品を提供する。【解決手段】汚染防止スキンケアマトリックスは保湿剤と汚染防止剤とを含み、前記汚染防止剤はDepollutine、Ciste'M、HerbaShield URB、和ism<宇治茶>及びEctoinを含む。該汚染防止スキンケアマトリックスは、さまざまな汚染から皮膚を保護し、皮膚への汚染物質の吸着を減少し、皮膚への汚染物質による損傷を回避し、且つ皮膚のアレルギー症状を軽減し、皮膚を浄化し、皮膚の老化を遅らせることができる。【選択図】なし |
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Bibliography: | Application Number: JP20200219963 |