MICROELECTROMECHANICAL RESONATOR

To enable temperature stability and wear resistance, for example.SOLUTION: In a MEMS device having a substrate and a movable micromachined member, a mechanical structure secures the movable micromachined member to the substrate, thermally isolates the movable micromachined member from the substrate,...

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Main Authors JOSEPH C DOLL, PAUL M HAGELIN, CHARLES I GROSJEAN, LUTZ MARKUS, ZHANG YI, PARTRIDGE AARON, TRUSHAL CHOKSHI, NICHOLAS MILLER, GINEL C HILL
Format Patent
LanguageEnglish
Japanese
Published 28.10.2021
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Summary:To enable temperature stability and wear resistance, for example.SOLUTION: In a MEMS device having a substrate and a movable micromachined member, a mechanical structure secures the movable micromachined member to the substrate, thermally isolates the movable micromachined member from the substrate, and provides a conduction path to enable heating of the movable micromachined member to a temperature of at least 300°C.SELECTED DRAWING: Figure 1A 【課題】 例えば温度安定化かつ損耗耐性を図ることである。【解決手段】 基材と、運動可能な微細機械加工部材と、を有するMEMS装置において、機械的構造が、運動可能な微細機械加工部材を基材に固定し、運動可能な微細機械加工部材を基材から断熱し、且つ、少なくとも300℃の温度への運動可能な微細機械加工部材の加熱を可能にするべく伝導経路を提供している。【選択図】 図1A
Bibliography:Application Number: JP20210116145