FILM DEPOSITION APPARATUS

• Main Author: FUCHIDA HIDETSUGU
• Format: Patent
• Language: English; Japanese
• Published: 21.10.2021
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; NOZZLES; PERFORMING OPERATIONS; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

To provide a film deposition apparatus capable of suppressing a contamination of a raw material particle into a film, the raw material particle not contributing to a film deposition.SOLUTION: A film deposition apparatus according to an aspect of the invention includes a generation chamber, a film deposition chamber, a transfer tube, a target, a stage, and a mask member. The target is arranged in the film deposition chamber, and has an irradiation surface receiving the irradiation of the aerosol ejected from the nozzle to charge the raw material particles into plasma by collision with the irradiation surface. The stage has a support surface for supporting a substrate on which a fine particle of the raw material particle generated by the discharge of a charged raw material particle is deposited. The mask member is arranged in the film deposition chamber and prevents the raw material particle regularly reflected on the irradiation surface among the raw material particles colliding with the irradiation surface from reaching the stage.SELECTED DRAWING: Figure 2 【課題】成膜に寄与しない原料粒子の膜中の混入を抑制することができる成膜装置を提供する。【解決手段】本発明の一形態に係る成膜装置は、生成室と、成膜室と、搬送管と、ターゲットと、ステージと、マスク部材とを具備する。前記ターゲットは、前記成膜室に配置され、前記ノズルから噴射された前記エアロゾルの照射を受ける照射面を有し、前記照射面との衝突により前記原料粒子をプラズマに帯電させる。前記ステージは、帯電した前記原料粒子の放電によって生成される前記原料粒子の微細粒子が堆積する基材を支持する支持面を有する。前記マスク部材は、前記成膜室に配置され、前記照射面に衝突した前記原料粒子のうち前記照射面において正反射した原料粒子の前記ステージへの到達を阻止する。【選択図】図２