IMPRINT DEVICE, IMPRINT METHOD, AND MANUFACTURING METHOD OF ARTICLE

• Main Author: ANDO TOSHIAKI
• Format: Patent
• Language: English; Japanese
• Published: 14.10.2021
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; SEMICONDUCTOR DEVICES; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

To provide an imprint device capable of suppressing the occurrence of contamination in a device due to uncured materials and the like.SOLUTION: An imprint device is characterized to include: a first irradiation part 2 irradiating an imprint material on a substrate 10 with light to cure the imprint material, while the imprint material is brought into contact with a pattern part having an uneven pattern formed in a mold; and a second irradiation part 26 (or a second irradiation part 27) irradiating a peripheral area of the pattern part of the mold with light, after the irradiation of the light by the first irradiation part 2.SELECTED DRAWING: Figure 3 【課題】未硬化材料等による装置内の汚染を抑制できるインプリント装置を提供する。【解決手段】基板１０の上のインプリント材に、モールドに形成された凹凸パターンを有するパターン部を接触させた状態で、インプリント材を硬化させるための光を照射する第１照射部２と、第１照射部２による光の照射後に、モールドのパターン部の周辺領域に光を照射する第２照射部２６（または第２照射部２７）と、を有することを特徴とする。【選択図】図３