RESIN COMPOSITION, LIGHT BLOCKING FILM, METHOD FOR PRODUCING LIGHT BLOCKING FILM, AND SUBSTRATE WITH PARTITION
To provide a resin composition useful for forming a partition on a substrate of a display device, the resin composition capable of forming a thick partition having both of the tactlessness of the film after prebaking and heat resistance after curing.SOLUTION: A resin composition has a photoradical g...
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Main Authors | , , , |
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Format | Patent |
Language | English Japanese |
Published |
11.10.2021
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a resin composition useful for forming a partition on a substrate of a display device, the resin composition capable of forming a thick partition having both of the tactlessness of the film after prebaking and heat resistance after curing.SOLUTION: A resin composition has a photoradical generator, a polysiloxane having specific two structures, and a (meth)acryl polymer having specific two structures, the weight ratio between the polysiloxane and the (meth)acryl polymer of 30/70-70/30.SELECTED DRAWING: Figure 1
【課題】表示装置の基板上の隔壁を形成するために有用な樹脂組成物であって、プリベーク後の膜のタックレス性と、キュア後の耐熱性を両立した厚膜隔壁を形成可能な樹脂組成物を提供すること。【解決手段】樹脂組成物は、光ラジカル発生剤と、特定の2種類の構造を含むポリシロキサンと、特定の2種類の構造を含む(メタ)アクリルポリマとを含有する樹脂組成物であって、ポリシロキサンと(メタ)アクリルポリマの重量比が30/70〜70/30である。【選択図】図1 |
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Bibliography: | Application Number: JP20210053007 |