RESIST UNDERLAY FILM-FORMING COMPOSITION COMPRISING LONG CHAIN ALKYL GROUP-CONTAINING NOVOLAC

• Main Authors: ENDO TAKAFUMI, SAITO DAIGO, SAKAMOTO RIKIMARU, KARASAWA RYO
• Format: Patent
• Language: English; Japanese
• Published: 07.10.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

To provide a resist underlay film-forming composition for forming a coating film with high leveling property on a substrate by improving thermal reflow properties of a polymer to improve fillability to a pattern at the time of sintering.SOLUTION: There is provided a resist underlay film-forming composition comprising a novolac resin obtained by the reaction of an aromatic compound (A) with an aldehyde (B) having a formyl group bonded to a secondary carbon atom or a tertiary carbon atom of an alkyl group having 2 to 26 carbon atoms. The novolac resin contains a unit structure represented by the following formula (2): (wherein, a1 and a2 each represents a benzene ring or a naphthalene ring which may be substituted, R1 represents a secondary amino group, b3 represents an alkyl group having 1 to 16 carbon atoms, b4 represents a hydrogen atom or an alkyl group having 1 to 9 carbon atoms.)SELECTED DRAWING: None 【課題】ポリマーの熱リフロー性を高めることで焼成時のパターンへの充填性を改善し、基板上に平坦化性の高い塗膜を形成するためのレジスト下層膜形成組成物。【解決手段】芳香族化合物（Ａ）と炭素原子数２〜２６のアルキル基の第２級炭素原子又は第３級炭素原子に結合したホルミル基を有するアルデヒド（Ｂ）との反応により得られるノボラック樹脂を含むレジスト下層膜形成組成物。ノボラック樹脂が下記式（２）：（式（２）中、ａ１及びａ２はそれぞれ置換されていても良いベンゼン環又はナフタレン環を示し、Ｒ１は第２級アミノ基を示し、ｂ３は炭素原子数１乃至１６のアルキル基を示し、ｂ４は水素原子又は炭素原子数１乃至９のアルキル基を示す。）で表される単位構造を含む。【選択図】なし