METHOD OF GAS INSPECTION, AND METHOD AND SYSTEM FOR TREATING SUBSTRATE

• Main Authors: AMIKURA NORIHIKO, MATSUDA RISAKO
• Format: Patent
• Language: English; Japanese
• Published: 30.09.2021
• Subjects: BASIC ELECTRIC ELEMENTS; CONTROLLING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PHYSICS; REGULATING; SEMICONDUCTOR DEVICES; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES

To provide a method of gas inspection adapted to appropriately inspect a behavior upon opening a secondary valve in a gas supply unit to supply gas into a treatment container of a substrate treatment installation.SOLUTION: A method of gas inspection includes the steps of: inputting a signal to open a secondary valve; measuring a pressure P downstream of an orifice of a flow controller at a time point elapsed a time period t from the signal input to open the secondary valve by use of a secondary pressure gauge; measuring a standard deviation of pressure σ downstream of the orifice of the flow controller at a time point elapsed a time period t from the signal input to open the secondary valve by use of the secondary pressure gauge; and determining whether the opening degree of the secondary valve is normal or not by comparing the pressure P and the standard deviation of pressure σ respectively with a threshold of pressure P0 and a threshold of standard deviation of pressure σ0.SELECTED DRAWING: Figure 4 【課題】基板処理装置の処理容器内にガスを供給するためのガス供給部における２次バルブを開く際の挙動を適切に検査する。【解決手段】ガス検査方法は、２次バルブを開く信号を入力する工程と、２次圧力計を用いて、２次バルブを開く信号の入力から期間ｔ経過時点における流量制御器のオリフィスの下流側の圧力Ｐを測定する工程と、２次圧力計を用いて、２次バルブを開く信号の入力から期間ｔ経過時点における流量制御器のオリフィスの下流側の圧力の標準偏差σを測定する工程と、圧力Ｐ及び圧力の標準偏差σとを、それぞれ圧力の閾値Ｐ０及び圧力の標準偏差の閾値σ０を比較し、２次バルブの開度が正常か否かを判定する工程と、を含む。【選択図】図４