DRAWING DEVICE, DATA PROCESSING DEVICE, DRAWING METHOD AND DRAWING DATA GENERATION METHOD

To provide a technique capable of reducing a computation resource or a computation time necessary to correct drawing data corresponding to the deformation of a substrate.SOLUTION: A data processing device: generates first division data showing each drawing content of a plurality of first mesh region...

Full description

Saved in:
Bibliographic Details
Main Authors MASUDA SHOTA, NAKATSU SATOSHI, NATAOCHI SHINYA, YASAKA SATOSHI
Format Patent
LanguageEnglish
Japanese
Published 30.09.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:To provide a technique capable of reducing a computation resource or a computation time necessary to correct drawing data corresponding to the deformation of a substrate.SOLUTION: A data processing device: generates first division data showing each drawing content of a plurality of first mesh regions obtained by dividing an initial drawing region expressed by initial drawing data by an initial mesh width to synthesize the drawing content of each first mesh region according to a position of each first mesh region rearranged on the basis of a position of the alignment mark of a first substrate and generate first drawing data; and generates second division data showing each drawing content of a plurality of second mesh regions obtained by dividing a first drawing region expressed by the first drawing data by a mesh width larger than the initial mesh width to synthesize the drawing content of each second mesh region according to a position of each second mesh region rearranged on the basis of a position of the alignment mark of a second substrate and generate second drawing data showing a second drawing region including a predetermined pattern.SELECTED DRAWING: Figure 1 【課題】基板の変形に応じた描画データの補正処理に必要な計算資源または計算時間を低減させる技術を提供する。【解決手段】データ処理装置は、初期描画データが表現する初期描画領域を初期メッシュ幅で分割して得られる複数の第１メッシュ領域の各描画内容を表す第１分割データを生成し、第１基板のアライメントマークの位置に基づいて、再配置された各第１メッシュ領域の位置に合わせて、各第１メッシュ領域の描画内容を合成し、第１描画データを生成する。データ処理装置は、第１描画データが表現する第１描画領域を初期メッシュ幅よりも大きいメッシュ幅で分割して得られる複数の第２メッシュ領域の各描画内容を表す第２分割データを生成し、第２基板のアライメントマークの位置に基づいて再配置された各第２メッシュ領域の位置に合わせて、各第２メッシュ領域の描画内容を合成し、所定パターンを含む第２描画領域を表す第２描画データを生成する。【選択図】図１
Bibliography:Application Number: JP20200052384