SUBSTRATE TREATMENT APPARATUS AND VACUUM EVACUATION METHOD

• Main Authors: NAKAKAWANISHI MANABU, YAMAGATA MOTOKI
• Format: Patent
• Language: English; Japanese
• Published: 30.09.2021
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To improve vacuum performance on a vacuum treatment vessel.SOLUTION: A substrate treatment apparatus for treating a substrate placed on a placement base inside a vacuum treatment vessel includes: a part with an NEG material which is disposed in the substrate treatment apparatus and coated with a non-evaporation type getter material (NEG material) or formed of the non-evaporation type getter material.SELECTED DRAWING: Figure 1 【課題】真空処理容器における真空性能を向上させる。【解決手段】真空処理容器内の載置台に載置された基板を処理する基板処理装置であって、前記基板処理装置に配置され、非蒸発型ゲッター材（ＮＥＧ材）によりコーティングされた又は非蒸発型ゲッター材により形成されたＮＥＧ材付パーツを有する基板処理装置が提供される。【選択図】図１