DEVICE FOR PRODUCING METAL NANOPARTICLE FROM METAL LUMP AS RAW MATERIAL
To provide a processor to metal nanoparticles at low cost, the processor having high efficiency.SOLUTION: A processor includes a housing 98, a rotary space 27 is provided on the housing, a rotary unit is provided on the rotary space 27, a transmission space 37 is provided on a right side of the rota...
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Main Author | |
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Format | Patent |
Language | English Japanese |
Published |
16.09.2021
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a processor to metal nanoparticles at low cost, the processor having high efficiency.SOLUTION: A processor includes a housing 98, a rotary space 27 is provided on the housing, a rotary unit is provided on the rotary space 27, a transmission space 37 is provided on a right side of the rotary space 27, a transmission unit is provided on the transmission space 37. A selection space is provided below the transmission space, a selection unit is provided on the selection space, a polishing space 70 is provided on a left side of the selection space, a polishing filtration plate 69 is fixed to a lower part of the polishing space 70. On a lower part of the polishing filtration plate 69, a metal particle transmission space 68 positioned on the housing is provided. The metal particle transmission space 68 extends to a left part of the selection space rightward, and on a lower part of the selection space, a molded product filtration plate 62 is provided.SELECTED DRAWING: Figure 1
【課題】低コスト、高効率の、金属ナノ粒子に対する加工装置を提供する。【解決手段】ハウジング98を含み、前記ハウジングには回動空間27が設けられ、前記回動空間27には回動ユニットが設けられ、前記回動空間27の右方には伝動空間37が設けられ、前記伝動空間37には伝動ユニットが設けられ、前記伝動空間の下方には選別空間が設けられ、前記選別空間には選別ユニットが設けられ、前記選別空間の左方には研磨空間70が設けられ、前記研磨空間70の下部には研磨ろ過板69が固定され、前記研磨ろ過板69の下方には前記ハウジングに位置する金属粒子搬送空間68が設けられ、前記金属粒子搬送空間68は右方へ前記選別空間の左部に延在しており、前記選別空間の下部には成品ろ過板62が設けられている。【選択図】図1 |
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Bibliography: | Application Number: JP20200101874 |