MANUFACTURING METHOD OF VAPOR DEPOSITION MASK
To provide a manufacturing method of manufacturing a vapor deposition mask at a high yield and at a low cost.SOLUTION: This method includes the steps of: forming a vapor deposition mask having multiple openings; arranging a resist film having a photocurable resin film and a protection film on the va...
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Main Authors | , , , |
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Format | Patent |
Language | English Japanese |
Published |
16.09.2021
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a manufacturing method of manufacturing a vapor deposition mask at a high yield and at a low cost.SOLUTION: This method includes the steps of: forming a vapor deposition mask having multiple openings; arranging a resist film having a photocurable resin film and a protection film on the vapor deposition mask such that the photocurable resin film is sandwiched by the vapor deposition mask and the protection film and the photocurable resin film covers the multiple openings; performing a first exposure to the photocurable resin film via the protection film; removing the protection film; performing a second exposure to the photocurable resin film after the protection film is removed; forming multiple resist masks by developing the photocurable resin film; arranging a support frame having at least one window on the vapor deposition mask so as to contact the vapor deposition mask; and forming a connection part for fixing the support frame to the vapor deposition mask by a plating method.SELECTED DRAWING: Figure 6
【課題】蒸着マスクユニットを高い歩留りで、または低コストで製造するための方法を提供すること。【解決手段】この方法は、複数の開口を有する蒸着マスクを形成すること、光硬化性樹脂膜と保護膜を有するレジストフィルムを、光硬化性樹脂膜が蒸着マスクと保護膜によって挟まれるように、かつ光硬化性樹脂膜が複数の開口を覆うように蒸着マスク上に配置すること、保護膜を介して光硬化性樹脂膜に第一露光を実施すること、保護膜を除去すること、保護膜を除去した後に光硬化性樹脂膜に第二露光を実施すること、光硬化性樹脂膜を現像することで複数のレジストマスクを形成すること、少なくとも一つの窓を有する支持フレームを、蒸着マスクに接するように、蒸着マスク上に配置すること、および支持フレームを蒸着マスクに固定する接続部をめっき法を用いて形成することを含む。【選択図】図6 |
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Bibliography: | Application Number: JP20200037764 |