GASIFYING DEVICE FOR STERILIZATION AGENT AND CLEANING METHOD OF GASIFYING DEVICE FOR STERILIZATION AGENT

To provide a cleaning method of a gasifying device for a sterilization agent capable of cleaning a heat generator that gasifies a sterilization agent and thus preventing a deposition of a stabilizer, so as to help stably generate for a long period of time a gas of a sterilization agent containing a...

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Main Authors TANAKA HIDENORI, HAYAKAWA MUTSUMI, TAKAGI MASATOSHI, SUZUKI KAZUFUMI, AKIYAMA HAYATO
Format Patent
LanguageEnglish
Japanese
Published 05.08.2021
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Summary:To provide a cleaning method of a gasifying device for a sterilization agent capable of cleaning a heat generator that gasifies a sterilization agent and thus preventing a deposition of a stabilizer, so as to help stably generate for a long period of time a gas of a sterilization agent containing a hydrogen peroxide being a sterilization component for sterilizing a packaging material in a high concentration, without disassembling the gasifying device for the sterilization agent.SOLUTION: A cleaning method is for cleaning a gasifying device for a sterilization agent including a sterilization agent feed part and a sterilization agent vaporization part, in which the sterilization agent vaporization part includes a heating body inside thereof, and is configured to supply a sterilization agent at least containing a hydrogen peroxide and a stabilizer from the sterilization agent feed part to the sterilization agent vaporization part, and to make the sterilization agent contact with a heating surface of the heating body, so as to gasify the sterilization agent. When the heating surface is cleaned by spraying a cleaning liquid to the heating surface, the temperature of the heating surface is 50°C to 250°C.SELECTED DRAWING: Figure 3 【課題】殺菌剤ガス化装置を分解することなく、殺菌剤をガス化させる発熱体を洗浄し、安定剤の堆積を防止することにより、包装材料を殺菌するための殺菌成分である過酸化水素を高濃度で含有する、殺菌剤のガスを長期間安定的に生成する殺菌剤ガス化装置の洗浄方法を提供する。【解決手段】殺菌剤供給部及び殺菌剤気化部を備え、前記殺菌剤気化部は内部に加熱体を備え、少なくとも過酸化水素及び安定剤を含む殺菌剤を前記殺菌剤供給部より前記殺菌剤気化部に供給し、前記殺菌剤を前記加熱体の加熱面に接触させて、前記殺菌剤をガス化させる殺菌剤ガス化装置を洗浄する洗浄方法であって、前記加熱面に洗浄用液体を吹き付けることにより、前記加熱面を洗浄するとき、前記加熱面の温度が50℃〜250℃とする。【選択図】図3
Bibliography:Application Number: JP20210081270