SEMICONDUCTOR DEVICE

To provide a semiconductor device having a structure that is able to sufficiently reduce parasitic capacitance between wires.SOLUTION: In a thin film transistor of a bottom gate structure, an oxide insulating layer serving as a channel protective layer is formed on a part of an oxide semiconductor l...

Full description

Saved in:
Bibliographic Details
Main Authors YAMAZAKI SHUNPEI, KUWABARA HIDEAKI, SASAKI TOSHINARI, NODA KOSEI, OHARA HIROKI
Format Patent
LanguageEnglish
Japanese
Published 26.07.2021
Subjects
Online AccessGet full text

Cover

Loading…