SEMICONDUCTOR DEVICE
To provide a semiconductor device having a structure that is able to sufficiently reduce parasitic capacitance between wires.SOLUTION: In a thin film transistor of a bottom gate structure, an oxide insulating layer serving as a channel protective layer is formed on a part of an oxide semiconductor l...
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Main Authors | , , , , |
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Format | Patent |
Language | English Japanese |
Published |
26.07.2021
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Subjects | |
Online Access | Get full text |
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