EXHAUST GAS INTRODUCTION PIPE OF SCRUBBER AND SCRUBBER

• Main Authors: KINDAICHI RIMPEI, ISHIBASHI NAOTO, BANDO AKIRA, KODAMA TOMOHIRO
• Format: Patent
• Language: English; Japanese
• Published: 01.07.2021
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SEMICONDUCTOR DEVICES; SEPARATION; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

To provide an exhaust gas introduction pipe of a scrubber which can inhibit generation of by-products.SOLUTION: An exhaust gas introduction pipe of a scrubber can remove a first gas which flows from a reactor, which enables vapor growth of an SiC thin film therein, through an exhaust pipe to be exhausted. The exhaust gas introduction pipe of the scrubber has: a first pipe flowing the first gas to a gas storage part of the scrubber; and a second pipe disposed at the radial outer side of the first pipe and forming a double pipe structure with the first pipe. The second pipe is a pipe for flowing a second gas having a temperature higher than that of the first gas to the gas storage part.SELECTED DRAWING: Figure 1 【課題】副生成物が発生することを抑制することができるスクラバーの排ガス導入管を提供する。【解決手段】このスクラバーの排ガス導入管は、内部でＳｉＣ薄膜の気相成長を行うことが可能な反応炉から、排気配管を流れ、排出される第１ガスを除害することが可能なスクラバーの排ガス導入管であって、前記スクラバーのガス収容部に前記第１ガスを流す第１配管と、前記第１配管の径方向外側に配置され、前記第１配管と二重配管構造を形成する第２配管と、を有し、前記第２配管は、前記ガス収容部に前記第１ガスよりも高温の第２ガスを流す配管である。【選択図】図１