COLORED PHOTOSENSITIVE COMPOSITION, COLORED FILM, METHOD FOR PRODUCING COLORED FILM, AND METHOD FOR PRODUCING PATTERNED COLORED FILM

• Main Author: ISHIKAWA TATSURO
• Format: Patent
• Language: English; Japanese
• Published: 24.06.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

To provide a colored photosensitive composition which enables formation of a pattern that suppresses generation of wrinkles, has good linearity and has high precision.SOLUTION: A colored photosensitive composition contains a photopolymerizable compound (A) having a specific structure, a hydrophobic resin (B), a photopolymerization initiator (C), a coloring agent (D) and a solvent (S). The photopolymerizable compound (A) contains a high-molecular-weight photopolymerizable compound (A1) having a mass average molecular weight of 3,500 or more and 5,500 or less and a low-molecular-weight photopolymerizable compound (A2) having a mass average molecular weight of 1,500 or more and 3,000 or less. The hydrophobic resin (B) is a copolymer of a hydrophobic monomer that is not freely mixed with water at room temperature and a hydrophilic monomer having at least one group selected from a hydroxy group and a carboxy group. A ratio of the hydrophobic monomer with respect to the total of the hydrophobic monomer and the hydrophilic monomer is 65 mol% or more and 95 mol% or less. A content of the hydrophobic resin (B) is more than 0 pt.mass and less than 5 pts.mass with respect to 100 pts.mass of the photopolymerizable compound (A).SELECTED DRAWING: None 【課題】シワの発生が抑制され且つ直進性が良く高精細なパターンを形成することができる着色感光性組成物を提供すること。【解決手段】特定構造の光重合性化合物（Ａ）と疎水性樹脂（Ｂ）と光重合開始剤（Ｃ）と着色剤（Ｄ）と溶剤（Ｓ）とを含有し、光重合性化合物（Ａ）は質量平均分子量が３５００以上５５００以下である高分子量光重合性化合物（Ａ１）と質量平均分子量が１５００以上３０００以下である低分子量光重合性化合物（Ａ２）とを含み、疎水性樹脂（Ｂ）が、室温で水と自由に混和しない疎水性単量体とヒドロキシ基及びカルボキシ基から選択される少なくとも一つの基を有する親水性単量体との共重合体であって、疎水性単量体と親水性単量体との合計に対する疎水性単量体の割合が６５モル％以上９５モル％以下であり、疎水性樹脂（Ｂ）の含有量が、光重合性化合物（Ａ）１００質量部に対して、０質量部超５質量部未満である着色感光性組成物。【選択図】なし