RADAR DEVICE

To provide a radar device in which the positional relation of a high-frequency conductive layer and an adhesive to a semiconductor component can be set as appropriate.SOLUTION: A radar device 1 includes a base material 2 where a plurality of high-frequency conductive layers 21 and 22 are provided on...

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Main Authors HIRATA SHUJI, TAINAKA YUSUKE, NIIOBI AKIRA, MATSUNOSHITA MASAHIRO, MUNEOKA ATSUSHI
Format Patent
LanguageEnglish
Japanese
Published 03.06.2021
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Summary:To provide a radar device in which the positional relation of a high-frequency conductive layer and an adhesive to a semiconductor component can be set as appropriate.SOLUTION: A radar device 1 includes a base material 2 where a plurality of high-frequency conductive layers 21 and 22 are provided on a front surface 201, a semiconductor component 3 in contact with the high-frequency conductive layers 21 and 22 through a conductive member, and an adhesive 4 that is used to attach the semiconductor component 3 to the front surface 201 of the base material 2. All the high-frequency conductive layers 21 and 22, when at least any of them is bent in a plane of the front surface 201, are provided ranging from inner end parts 211 and 221 of the front surface 201 opposite to a bottom surface 301 of the semiconductor component 3 to outer end parts 212 and 222 positioned on a first direction D1 side relative to a first side surface 302A of the semiconductor component 3 facing the first direction D1. The adhesive 4 is in contact with the front surface 201 excluding a part where the high-frequency conductive layers 21 and 22 are formed, and side surfaces 302A and 302B of the semiconductor component 3.SELECTED DRAWING: Figure 4 【課題】半導体部品に対する、高周波導体層及び接着剤の配置関係を適切に設定することができるレーダ装置を提供する。【解決手段】レーダ装置1は、表側面201に複数の高周波導体層21,22が設けられた基材2と、高周波導体層21,22に導電部材を介して接触する半導体部品3と、半導体部品3を基材2の表側面201に接着する接着剤4とを備える。複数の高周波導体層21,22のすべては、少なくともいずれかが表側面201の平面内において屈曲することにより、表側面201における、半導体部品3の底面301と対向する内側端部211,221から、半導体部品3の第1方向D1に向けられた第1側面302Aよりも第1方向D1の側に位置する外側端部212,222まで設けられている。接着剤4は、複数の高周波導体層21,22の形成部位を除く表側面201と、半導体部品3の側面302A,302Bとに接触している。【選択図】図4
Bibliography:Application Number: JP20190215960