GLASS CLOTH

• Main Authors: NISHINAKA DAISUKE, HATTORI TAKESHI
• Format: Patent
• Language: English; Japanese
• Published: 20.05.2021
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; CHEMISTRY; COMPOSITIONS BASED THEREON; GENERAL PROCESSES OF COMPOUNDING; LOOMS; METALLURGY; METHODS OF WEAVING; ORGANIC MACROMOLECULAR COMPOUNDS; TEXTILES; THEIR PREPARATION OR CHEMICAL WORKING-UP; WEAVING; WORKING-UP; WOVEN FABRICS

To provide a glass cloth capable of suppressing generation of pinholes and suppressing generation of longitudinal wrinkles, even when a prepreg is obtained by impregnating a low-mass glass cloth with a resin solution so that a mass ratio of the glass cloth becomes low.SOLUTION: A glass cloth has a mass of 10 g/m2 or less. A design value Iwd of a gap between neighboring warps of the glass cloth is 95 μm or less and a design value Ifd of a gap between neighboring wefts is 95 μm or less. A ratio (Iw/If) of an observed value (Iw) of a gap between neighboring warps of the glass cloth to an observed value (If) of a gap between neighboring wefts is 1.10 or more and 1.60 or less. An area ratio of basket holes of the glass cloth is 12% or more and 20% or less.SELECTED DRAWING: None 【課題】 低質量のガラスクロスを該ガラスクロスの質量割合が低いものとなるように樹脂溶液を含浸させてプリプレグとする際にも、ピンホール発生の抑制と、上記タテシワ発生の抑制との両立を図ることができるガラスクロスの提供を主な課題とする。【解決手段】 質量が１０ｇ／ｍ２以下のガラスクロスであって、前記ガラスクロスの、隣接する経糸間の隙間設計値Ｉｗｄが９５μｍ以下、及び隣接する緯糸間の隙間設計値Ｉｆｄが９５μｍ以下であり、前記ガラスクロスの、隣接する経糸間の隙間実測値（Ｉｗ）と隣接する緯糸間の隙間実測値（Ｉｆ）との比（Ｉｗ／Ｉｆ）が１．１０以上１．６０以下であり、前記ガラスクロスの、バスケットホール面積割合が１２％以上２０％以下である、ガラスクロス。【選択図】 なし