METHOD FOR PRODUCING GALLIUM OXIDE

To provide a method for producing gallium oxide that can produce γ-Ga2O3 at low temperature and in a relatively simple step and can reduce the production cost.SOLUTION: A raw material solution comprising liquid gallium and a reductant is irradiated with ultrasonic waves, to form particles having γ-g...

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Bibliographic Details
Main Authors KOBAYASHI TOSHIKI, TAKIZAWA HIROTANE, TAKANO YUKI, HAYASHI YAMATO
Format Patent
LanguageEnglish
Japanese
Published 30.04.2021
Subjects
CHEMISTRY
COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F
INORGANIC CHEMISTRY
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
METALLURGY
NANOTECHNOLOGY
PERFORMING OPERATIONS
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
TRANSPORTING
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Summary:To provide a method for producing gallium oxide that can produce γ-Ga2O3 at low temperature and in a relatively simple step and can reduce the production cost.SOLUTION: A raw material solution comprising liquid gallium and a reductant is irradiated with ultrasonic waves, to form particles having γ-gallium oxide (γ-Ga2O3) crystals at least on the surface.SELECTED DRAWING: Figure 1 【課題】低温かつ比較的簡単な工程でγ−Ｇａ２Ｏ３を製造することができ、製造コストを低減することができる酸化ガリウムの製造方法を提供する。【解決手段】液体のガリウムと還元剤とを含む原料溶液に対して超音波を照射することにより、少なくとも表面にγ−酸化ガリウム（γ−Ｇａ２Ｏ３）の結晶を有する粒子を形成する。【選択図】図１
Bibliography:Application Number: JP20190194105