COMPOSITION FOR THIN FILM DEPOSITION, METHOD FOR MANUFACTURING THIN FILM BY USE THEREOF, THIN FILM MANUFACTURED FROM THE COMPOSITION FOR THIN FILM DEPOSITION, AND SEMICONDUCTOR DEVICE INCLUDING THE THIN FILM

• Main Authors: CHEON HWAN-SUNG, OH BUKEUN, KIM YONG-TAE, BAK GYEONG RYEONG, SEONG TAEGEUN, IM SANG KYUN, LIM SEOL HEE
• Format: Patent
• Language: English; Japanese
• Published: 22.04.2021
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

To improve a composition for thin film deposition in viscosity and volatility, and to provide a semiconductor device of which the electric property is highly reliable because of including a thin film manufactured from the composition for thin film deposition.SOLUTION: The invention relates to: a composition for thin film deposition, comprising an organic metal compound including strontium, barium or a combination thereof, and a compound represented by the chemical formula 1 below and including at least one unshared electron pair containing compound; a method for manufacturing a thin film by use of the composition for thin film deposition; a thin film manufactured from the composition for thin film deposition; and a semiconductor device including the thin film. The definition of R1-R3 in the chemical formula 1 is as described in the SPECIFICATION hereof.SELECTED DRAWING: Figure 3 【課題】薄膜蒸着用組成物の粘度と揮発性を改善することができ、前記薄膜蒸着用組成物から製造された薄膜を含むことによって電気的特性に対する信頼性の高い半導体素子を提供することができる。【解決手段】ストロンチウム、バリウム、またはこれらの組み合わせを含む有機金属化合物；および下記化学式１で示される少なくとも一つの非共有電子対含有化合物を含む薄膜蒸着用組成物、前記薄膜蒸着用組成物を用いた薄膜の製造方法、および前記薄膜蒸着用組成物から製造された薄膜、および前記薄膜を含む半導体素子に関するものである。上記化学式１中、Ｒ１〜Ｒ３の定義は明細書に記載した通りである。【選択図】図３