COMPOSITION FOR SEMICONDUCTOR PHOTORESIST AND PATTERNING METHOD USING THE SAME

To provide a composition for semiconductor photoresist having excellent sensitivity and storage stability.SOLUTION: A composition for semiconductor photoresist contains: an organometallic compound that contains at least one specific structure compound having a structure in which two carbonyloxy grou...

Full description

Saved in:
Bibliographic Details
Main Authors CHEON HWAN-SUNG, KANG EUNMI, CHAE SEUNGYONG, WOO CHANG SOO, MOON KYUNG SOO, NAMGUNG RAN, KIM JIMIN, KIM JAE-HYUN, HAN SEUNG
Format Patent
LanguageEnglish
Japanese
Published 22.04.2021
Subjects
ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:To provide a composition for semiconductor photoresist having excellent sensitivity and storage stability.SOLUTION: A composition for semiconductor photoresist contains: an organometallic compound that contains at least one specific structure compound having a structure in which two carbonyloxy groups are bound to tin (Sn) element at two sites and become bidentate ligands; and a solvent. There is also provided a patterning method using the same.SELECTED DRAWING: None 【課題】感度および保管安定性に優れた半導体フォトレジスト用組成物の提供。【解決手段】２つのカルボニルオキシ基がスズ（Ｓｎ）元素と２か所で結合する二座配位子となる構造を有する特定構造の化合物のうちの１種以上の化合物を含む有機金属化合物、および溶媒を含む半導体フォトレジスト用組成物、ならびにこれを利用したパターン形成方法。【選択図】なし
Bibliography:Application Number: JP20200171971