SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND SEMICONDUCTOR LIGHT-EMITTING DEVICE

To provide a semiconductor light-emitting element and the like having high heat dissipation.SOLUTION: A semiconductor light-emitting element 21 comprises: a semiconductor laminate 30 that includes an n-type layer 32, a p-type layer 36, and an n exposed part 30e; a p wiring electrode layer 42 that is...

Full description

Saved in:
Bibliographic Details
Main Authors HAYASHI SHIGEO, NOGOME MASANOBU, HIROKI HIRANORI, MITSUI YASUTOMO, KUNO YASUMITSU, KUME MASAHIRO
Format Patent
LanguageEnglish
Japanese
Published 04.03.2021
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:To provide a semiconductor light-emitting element and the like having high heat dissipation.SOLUTION: A semiconductor light-emitting element 21 comprises: a semiconductor laminate 30 that includes an n-type layer 32, a p-type layer 36, and an n exposed part 30e; a p wiring electrode layer 42 that is arranged on the p-type layer 36; an isolation layer 44 that continuously covers an inner surface 30s of the n exposed part 30e and a part of an upper part of the p wiring electrode layer 42 and has an opening part 44a; an n wiring electrode layer 46 that contacts with the n-type layer 32 in the opening part 44a and is arranged above the p-type layer 36 and the p wiring electrode layer 42 via the isolation layer 44; and a first n connection member 51. The first n connection member 51 is a bump made of an alloy composed of one of Au, Ag, Al, and Cu or a combination thereof and is connected with the n wiring electrode layer 46 in a first n terminal area 51r. The n wiring electrode layer 46 and the p-type layer 36 are arranged below the first n terminal area 51r in a cross section parallel to a lamination direction of the semiconductor laminate 30.SELECTED DRAWING: Figure 2A 【課題】放熱性が高い半導体発光素子等を提供する。【解決手段】半導体発光素子21は、n型層32と、p型層36とを有する半導体積層体30であって、n露出部30eを有する半導体積層体30と、p型層36上に配置されたp配線電極層42と、n露出部30eの内側面30sと、p配線電極層42の上方の一部とを連続的に覆い、開口部44aを有する絶縁層44と、開口部44aにおいてn型層32に接し、絶縁層44を介してp型層36及びp配線電極層42の上方に配置されたn配線電極層46と、第1のn接続部材51とを有し、第1のn接続部材51は、Au、Ag、Al、Cuのいずれか、又は、それらの組み合わせからなる合金で構成されるバンプであり、第1のn端子領域51rにおいてn配線電極層46と接続され、半導体積層体30の積層方向に平行な断面において、第1のn端子領域51rの下方に、n配線電極層46及びp型層36が配置される。【選択図】図2A
Bibliography:Application Number: JP20200202203