DRAWING METHOD AND DRAWING DEVICE

• Main Authors: NORIMITSU YOSHINAO, MATSUI HIROSHI
• Format: Patent
• Language: English; Japanese
• Published: 01.03.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To suppress reduction of a depth of focus and achieve refinement of a formed pattern shape.SOLUTION: A drawing method comprises: a step for radiating drawing light in a second drawing pattern having a first shift pattern at least partially, to a photo sensitive material; a step for developing the ph...