DRAWING METHOD AND DRAWING DEVICE

To suppress reduction of a depth of focus and achieve refinement of a formed pattern shape.SOLUTION: A drawing method comprises: a step for radiating drawing light in a second drawing pattern having a first shift pattern at least partially, to a photo sensitive material; a step for developing the ph...

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Bibliographic Details
Main Authors NORIMITSU YOSHINAO, MATSUI HIROSHI
Format Patent
LanguageEnglish
Japanese
Published 01.03.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:To suppress reduction of a depth of focus and achieve refinement of a formed pattern shape.SOLUTION: A drawing method comprises: a step for radiating drawing light in a second drawing pattern having a first shift pattern at least partially, to a photo sensitive material; a step for developing the photo sensitive material; and a step for forming a first pattern shape on a top face of a substrate. The first shift pattern overlaps at least partially to a corresponding unit pattern on the first drawing pattern, and is deviated from the corresponding unit pattern.SELECTED DRAWING: Figure 7 【課題】焦点深度の低下などを抑制しつつ、形成されるパターン形状の微細化を実現する。【解決手段】描画方法は、感光材料に対し、第１のシフトパターンを少なくとも一部に有する第２の描画パターンで、描画光を照射する工程と、感光材料を現像する工程と、基板の上面に第１のパターン形状を形成する工程とを備え、第１のシフトパターンは、第１の描画パターンにおける対応する単位パターンに少なくとも一部で重なり、かつ、対応する単位パターンからずれる単位パターンである。【選択図】図７
Bibliography:Application Number: JP20190151182