EUV CHAMBER DEVICE, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND PRODUCTION METHOD OF ELECTRONIC DEVICE

SOLUTION: An EUV chamber device comprises: a chamber 2a; a target generation part 26a for outputting a target 27 toward a prescribed region in the chamber; a gas nozzle 52 for supplying a gas into the chamber; and a shroud 8a for surrounding at least a part of a locus of the target in the chamber an...

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Bibliographic Details
Main Authors HOSHINO YUTA, OKADA TAKASHI, KAMIYA KOICHIRO, NISHISAKA TOSHIHIRO
Format Patent
LanguageEnglish
Japanese
Published 18.02.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
X-RAY TECHNIQUE
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Summary:SOLUTION: An EUV chamber device comprises: a chamber 2a; a target generation part 26a for outputting a target 27 toward a prescribed region in the chamber; a gas nozzle 52 for supplying a gas into the chamber; and a shroud 8a for surrounding at least a part of a locus of the target in the chamber and including a first channel for circulating a first cooling medium.EFFECT: Deviation of target position from an ideal locus can be suppressed.SELECTED DRAWING: Figure 3 【解決手段】ＥＵＶチャンバ装置は、チャンバ２ａと、チャンバの内部の所定領域に向けてターゲット２７を出力するターゲット生成部２６ａと、チャンバの内部にガスを供給するガスノズル５２と、第１の冷却媒体を流通させる第１の流路を含み、チャンバの内部においてターゲットの軌道の少なくとも一部を囲むシュラウド８ａと、を備える。【効果】ターゲットの位置が理想的な軌道からずれてしまうことが抑制される。【選択図】図３
Bibliography:Application Number: JP20190136640