PHOTOELECTRIC CONVERTER
To provide a photoelectric conversion element capable of restraining increase in man hours while restraining degradation in characteristics, and to provide a manufacturing method of the photoelectric conversion element.SOLUTION: A photoelectric conversion element includes a dielectric film 6 contain...
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Main Authors | , , |
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Format | Patent |
Language | English Japanese |
Published |
04.02.2021
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a photoelectric conversion element capable of restraining increase in man hours while restraining degradation in characteristics, and to provide a manufacturing method of the photoelectric conversion element.SOLUTION: A photoelectric conversion element includes a dielectric film 6 containing carbon and silicon on the first face 1a side of a first conductivity type or second conductivity type semiconductor substrate 1, a first conductivity type noncrystalline semiconductor film 3 and a second conductivity type noncrystalline semiconductor film 5 on the second face 1b side opposite to the first face 1a, a first electrode 7 on the first conductivity type noncrystalline semiconductor film 3, and a second 8 on the second conductivity type noncrystalline semiconductor film 5. The dielectric film 6 has a constitution represented by a formula SiCxNyOzFwHv (0<x, 0≤y<x, 0≤z<x, 0≤w<x and 0≤v). The dielectric film 6 is the outermost film. The photoelectric conversion element further includes a silicon nitride film 16 between the semiconductor substrate 1 and the dielectric film 6.SELECTED DRAWING: Figure 1
【課題】特性の低下を抑えつつ、工数の増加も抑えることができる光電変換素子および光電変換素子の製造方法を提供する。【解決手段】光電変換素子は、第1導電型または第2導電型の半導体基板1の第1の面1a側の炭素と珪素とを含む誘電体膜6と、第1の面1aと反対側の第2の面1b側の第1導電型非晶質半導体膜3および第2導電型非晶質半導体膜5と、第1導電型非晶質半導体膜3上の第1電極7と、第2導電型非晶質半導体膜5上の第2電極8とを備えている。誘電体膜6はSiCxNyOzFwHv(0<x、0≦y<x、0≦z<x、0≦w<xおよび0≦v)の式で表わされる組成を有している。誘電体膜6は最外膜である。半導体基板1と誘電体膜6との間に窒化シリコン膜16をさらに備える。【選択図】図1 |
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Bibliography: | Application Number: JP20200185569 |