SUBSTRATE PROCESSING APPARATUS

• Main Authors: ONZUKA KEIJI, MURAKAMI KOKI, HOSHINO HIROZUMI
• Format: Patent
• Language: English; Japanese
• Published: 28.01.2021
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

To perform batch processing with high in-plane uniformity even for a warped substrate.SOLUTION: A substrate processing apparatus includes a substrate arrangement mechanism that forms an alternating substrate arrangement consisting of alternating combinations of a first board taken out from a first board storage container by a second board transfer mechanism after returning to the first board storage container since the adjustment of the rotation direction position by a position adjustment unit, and a second board taken out from a second board storage container by the second board transfer mechanism after returning to the second board storage container since the adjustment of the rotation direction position by the position adjustment unit. When batch processing in a processing unit is performed on a board having an alternating substrate arrangement in which the pattern forming surfaces of the first and the second boards face each other or the pattern non-forming surfaces of the first and the second boards face each other, the position adjustment unit adjusts the rotation direction position such that the first board stored in the first board storage container faces the position in the first rotation direction and the second board stored in the second board storage container faces the position in the second rotation direction.SELECTED DRAWING: Figure 3 【課題】反った基板に対しても面内均一性の高いバッチ処理を行う。【解決手段】基板処理装置は、位置調節部による回転方向位置調節後に第１基板収納容器に戻された後、第２基板搬送機構により第１基板収納容器から一括して取り出された第１基板と、位置調節部による回転方向位置調節後に第２基板収納容器に戻された後、第２基板搬送機構により第２基板収納容器から一括して取り出された第２基板とを交互に組み合わせてなる交互基板配列を形成する基板配列機構を有する。処理部でのバッチ処理が、第１基板および第２基板のパターン形成面同士が対面するか又は第１基板および第２基板のパターン非形成面同士が対面する交互基板配列をなす基板に対して行われる場合、第１基板収納容器に収納された第１基板が第１回転方向位置、第２基板収納容器に収納された第２基板が第２回転方向位置を向くように位置調整部が回転方向位置調節を行う。【選択図】図３