METHOD FOR REMOVING HALOGENATED ETHYLENE IMPURITY IN 2,3,3,3-TETRAFLUOROPROPENE PRODUCT

• Main Authors: WANG HAIYOU, TUNG HSUEH SUNG
• Format: Patent
• Language: English; Japanese
• Published: 21.01.2021
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; CHEMISTRY; METALLURGY; ORGANIC CHEMISTRY

To provide: a composition that comprises a high-purity HFO-1234yf; and methods for purifying HFO-1234yf.SOLUTION: A composition comprises 2,3,3,3-tetrafluoropropene and halogenated ethylene impurities including HCFO-1131(CH2=CFCl and/or trans-/cis-CHF=CHCl), HCO-1140(CH2=CHCl) or combination thereof. The halogenated ethylene impurities are present in the amount of more than 0 ppm to 50 ppm or less and 2,3,3,3-tetrafluoropropene is present in the composition in the amount of at least 90 wt.%.SELECTED DRAWING: None 【課題】高純度ＨＦＯ−１２３４ｙｆを含有する組成物及びＨＦＯ−１２３４ｙｆの精製方法の提供。【解決手段】２，３，３，３−テトラフルオロプロペン、及び、ＨＣＦＯ−１１３１（ＣＨ２＝ＣＦＣｌ及び／又はトランス／シス−ＣＨＦ＝ＣＨＣｌ）、ＨＣＯ−１１４０（ＣＨ２＝ＣＨＣｌ）、又はこれらの組み合わせを含むハロゲン化エチレン不純物を含む組成物であって、前記ハロゲン化エチレン不純物が０ｐｐｍを超え５０ｐｐｍ以下の量で前記組成物中に存在し、２，３，３，３−テトラフルオロプロペンが、少なくとも９０重量％で前記組成物中に存在する、組成物。【選択図】なし