METHOD AND DEVICE FOR CLEANING INSIDE OF ORAL CAVITY

To provide an easily-manufacturable plasma device, and a method of its application.SOLUTION: A method herein has an irradiation step for supplying a plasma generation gas to a plasma generation part having an electrode at a rate of 5.0 L or less per minute, applying a voltage at less than 20 kVpps t...

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Bibliographic Details
Main Authors UEHARA TAKESHI, MOROOKA AKIRA, KANEZASHI MIKIMOTO, NISHI HIROAKI
Format Patent
LanguageEnglish
Japanese
Published 14.01.2021
Subjects
APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
DENTISTRY
DIAGNOSIS
ELECTROTHERAPY
HUMAN NECESSITIES
HYGIENE
IDENTIFICATION
MAGNETOTHERAPY
MEDICAL OR VETERINARY SCIENCE
RADIATION THERAPY
SURGERY
ULTRASOUND THERAPY
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Summary:To provide an easily-manufacturable plasma device, and a method of its application.SOLUTION: A method herein has an irradiation step for supplying a plasma generation gas to a plasma generation part having an electrode at a rate of 5.0 L or less per minute, applying a voltage at less than 20 kVpps to the plasma generation gas for generating plasma, and using an active species generated from the plasma to irradiate an oral cavity. In the irradiation step, preferably, the active species is used to irradiate a tooth surface. Preferably, the plasma generation gas contains nitrogen.SELECTED DRAWING: Figure 1 【課題】製造が簡便なプラズマ装置、及びその使用方法。【解決手段】電極を有するプラズマ発生部にプラズマ生成用ガスを毎分５．０Ｌ以下で供給し、前記プラズマ生成用ガスに電圧を２０ｋＶｐｓｓ未満で印加してプラズマを発生させ、前記プラズマにより生じた活性種を口腔内に照射する照射工程を有することよりなる。前記照射工程は、前記活性種を歯面に照射することが好ましく、前記プラズマ生成用ガスは、窒素を含有することが好ましい。【選択図】図１
Bibliography:Application Number: JP20200172730