MASK CLEANING METHOD

• Main Authors: KADOWAKI YUTAKA, AKASE JINEI, IKE MASAKUNI, YOSHIDA TOSHINOBU
• Format: Patent
• Language: English; Japanese
• Published: 07.01.2021
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; CLEANING; CLEANING IN GENERAL; CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

To provide a cleaning method of a mask capable of removing a deposit attached on a mask body and suppressing an erosion of the mask body.SOLUTION: A cleaning method of a mask for removing a deposit 60 attached on a mask 30 includes at least a step where the mask 30 is immersed in a cleaning liquid using an etching solution containing a chelate agent as a cleaning liquid, a molecular constituent element of the chelate agent being consisted of C, O, H, and Na, C being not contained in other than a main chain.SELECTED DRAWING: Figure 6 【課題】マスクの本体に付着した堆積物の除去が可能であり、かつ、マスクの本体の溶損が抑制できるマスクの洗浄方法の提供。【解決手段】洗浄液としてキレート剤を含むエッチング溶液を用い、マスク３０を洗浄液に浸漬する工程を少なくとも備えており、キレート剤として、分子構成元素が、Ｃ，Ｏ，Ｈ，及びＮａから構成され、主鎖以外にＣを含まないものを用いることを特徴とするマスク３０に付着した堆積物６０を除去するマスクの洗浄方法。【選択図】図６