POROUS PAD AND VACUUM CHUCK DEVICE

To provide a porous pad and a vacuum chuck device that can prevent the position of an installed work from shifting with respect to the porous pad.SOLUTION: A porous pad 20 includes an installation surface 20a on which a workpiece W is installed and allows fluid to pass therethrough. The porous pad 2...

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Bibliographic Details
Main Authors TAKADA ATSUSHI, NGUYEN TUNG THANH, OHASHI KYOSUKE, TAKADA DAICHI
Format Patent
LanguageEnglish
Japanese
Published 24.12.2020
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Summary:To provide a porous pad and a vacuum chuck device that can prevent the position of an installed work from shifting with respect to the porous pad.SOLUTION: A porous pad 20 includes an installation surface 20a on which a workpiece W is installed and allows fluid to pass therethrough. The porous pad 20 includes a porous ceramic portion 25 that has a plurality of particles 26 formed so as to be connected to each other, and in which pores 29 are formed between the plurality of particles 26, and a non-slip layer 27 that has a larger coefficient of static friction with respect to the workpiece W than the porous ceramic portion 25, and is formed on the outer surface of the particles 26 and is exposed on the installation surface 20a.SELECTED DRAWING: Figure 3 【課題】設置されたワークの位置が多孔質パッドに対してずれることを抑制できる多孔質パッド及び真空チャック装置を提供する。【解決手段】多孔質パッド20はワークWが設置される設置面20aを備え、流体を通過させる。多孔質パッド20は、互いに連なるように形成される複数の粒子26を有し、複数の粒子26の間に気孔29が形成される多孔質セラミック部25と、ワークWに対する静摩擦係数が多孔質セラミック部25よりも大きく、粒子26の外面に形成され、設置面20aに露出する滑り止め層27と、を備える。【選択図】図3
Bibliography:Application Number: JP20190113687