GLASS CLOTH FOR LOW-DIELECTRIC MATERIAL, AND PREPREG AND PRINTED WIRING SUBSTRATE USING THE SAME

To provide a glass cloth having improved dielectric properties by reducing a silanol group existing on a surface of the glass cloth while the surface of the glass cloth is treated with polysilazane.SOLUTION: A glass cloth for a low-dielectric material is surface-treated with a composition containing...

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Bibliographic Details
Main Authors HIRANO FUMIYA, ABE SHINJI
Format Patent
LanguageEnglish
Japanese
Published 03.12.2020
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Summary:To provide a glass cloth having improved dielectric properties by reducing a silanol group existing on a surface of the glass cloth while the surface of the glass cloth is treated with polysilazane.SOLUTION: A glass cloth for a low-dielectric material is surface-treated with a composition containing polysilazane in which 0 to 90 mol% of substituents bonded to silicon atoms in one molecule is a group selected from an aliphatic hydrocarbon group with 1 to 12 carbon atoms, an aromatic hydrocarbon group with 6 to 12 carbon atoms, an alkoxy group with 1 to 6 carbon atoms, and a monovalent organic group having one carbon-carbon unsaturated bond with 2 to 12 carbon atoms in one molecule and is used for 5G/IoT and a printed wiring substrate for high frequency.SELECTED DRAWING: None 【課題】ガラスクロスの表面がポリシラザンで処理され、ガラスクロス表面に存在するシラノール基を低減させて誘電特性を向上させたガラスクロスを提供する。【解決手段】低誘電材料用ガラスクロスが、1分子中のケイ素原子に結合する置換基の0〜90モル%が炭素数1〜12の脂肪族炭化水素基、炭素数6〜12の芳香族炭化水素基、炭素数1〜6のアルコキシ基、及び1分子中に1個の炭素−炭素不飽和結合を有する炭素数2〜12の1価の有機基から選ばれる基であるポリシラザンを含有する組成物で表面処理され、5G/IoT向けおよび高周波用プリント配線基板に用いられる。【選択図】なし
Bibliography:Application Number: JP20190099679