COMPOSITION FOR THICK FILM RESISTOR, PASTE FOR THICK FILM RESISTOR AND THICK FILM RESISTOR

• Main Authors: KAWAKUBO KATSUHIRO, OZAWA MAKOTO, MAKUTA FUJIO
• Format: Patent
• Language: English; Japanese
• Published: 29.10.2020
• Subjects: CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GLASS; INORGANIC CHEMISTRY; JOINING GLASS TO GLASS OR OTHER MATERIALS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; METALLURGY; MINERAL OR SLAG WOOL; PRINTED CIRCUITS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS

To provide a composition for a thick film resistor, which is superior in resistance temperature coefficient and noise characteristic, and contains no lead component.SOLUTION: Provided is a composition for a thick film resistor, which comprises ruthenium oxide powder, glass powder and zirconium oxide powder and no lead component. The glass powder contains SiO2, B2O3 and RO (R represents one or more alkaline-earth elements selected from Ca, Sr and Ba); when a total content of SiO2, B2O3 and RO is 100 pts.mass, SiO2 is 10 pts.mass or more and 50 pts.mass or less, B2O3 is 8 pts.mass or more and 30 pts.mass or less, and RO is 40 pts.mass or more and 65 pts.mass or less. The zirconium oxide powder is 5 nm or larger and 100 nm or smaller in specific surface area diameter; when the total content of the ruthenium oxide powder and glass powder is 100 pts.mass, the zirconium oxide powder is involved at a rate of 0.1 pt.mass or more and 4 pts.mass or less.SELECTED DRAWING: None 【課題】抵抗温度係数とノイズ特性に優れた鉛成分を含有しない厚膜抵抗体用組成物を提供することを目的とする。【解決手段】鉛成分を含有せず、酸化ルテニウム粉末と、ガラス粉末と、酸化ジルコニウム粉末と、を含み、前記ガラス粉末は、ＳｉＯ２とＢ２Ｏ３とＲＯ（ＲはＣａ、Ｓｒ、Ｂａから選択される１種類以上のアルカリ土類元素を示す）を含み、前記ＳｉＯ２と前記Ｂ２Ｏ３と前記ＲＯとの含有量の合計を１００質量部とした場合に、前記ＳｉＯ２を１０質量部以上５０質量部以下、前記Ｂ２Ｏ３を８質量部以上３０質量部以下、前記ＲＯを４０質量部以上６５質量部以下の割合で含有し、前記酸化ジルコニウム粉末は、比表面積径が５ｎｍ以上１００ｎｍ以下であり、前記酸化ルテニウム粉末と前記ガラス粉末との含有量の合計を１００質量部とした場合に、前記酸化ジルコニウム粉末を０．１質量部以上４質量部以下の割合で含む厚膜抵抗体用組成物を提供する。【選択図】なし