ION SOURCE, ION IMPLANTER, AND MAGNESIUM ION GENERATION METHOD

• Main Authors: SASAKI NORIYASU, YUSE TAKUMI, SUZUKI HIDEO
• Format: Patent
• Language: English; Japanese
• Published: 22.10.2020
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To provide an ion source having a long life, which can generate a stable magnesium ion with a simple structure.SOLUTION: An ion source 10 according to the present invention heats a cathode electrode 22 by an energized filament 20 and emits thermoelectrons from an electron emitting surface 38 toward a repeller electrode 23, controls the potentials of the cathode electrode 22 and the repeller electrode 23 such that the thermoelectrons reciprocate between the cathode electrode 22 and the repeller electrode 23, and decomposes introduced sputter gas by the thermoelectrons to generate plasma of sputter gas. A raw material block 28 is sputtered by the ions in the plasma to generate positively charged magnesium ions.SELECTED DRAWING: Figure 2 【課題】簡素な構成で安定したマグネシウムイオンを生成することができるとともに、寿命の長いイオン源を提供する。【解決手段】本発明のイオン源１０は、通電されたフィラメント２０によってカソード電極２２を加熱し、電子放出面３８からリペラ電極２３に向かって熱電子を放出させ、この熱電子がカソード電極２２とリペラ電極２３との間で往復移動するようにカソード電極２２及びリペラ電極２３の電位を制御し、導入されたスパッタガスを熱電子によって分解してスパッタガスのプラズマを生成する。このプラズマ中のイオンによって原料ブロック２８をスパッタして正電荷のマグネシウムイオンを生成する。【選択図】 図２