PHOTOSENSITIVE RESIN COMPOSITION
To provide a photosensitive resin composition which allows formation of a small-diameter via without causing an undercut at the via bottom.SOLUTION: The photosensitive resin composition comprises an epoxy resin (component (A)), a (meth)acrylate-modified phenolic resin (component (B)), a photopolymer...
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Main Authors | , , |
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Format | Patent |
Language | English Japanese |
Published |
24.09.2020
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a photosensitive resin composition which allows formation of a small-diameter via without causing an undercut at the via bottom.SOLUTION: The photosensitive resin composition comprises an epoxy resin (component (A)), a (meth)acrylate-modified phenolic resin (component (B)), a photopolymerization initiator (component (C)), and an inorganic filler (component (D)). The epoxy resin (component (A)) contains an epoxy resin having a number average molecular weight of 1000 or less; the inorganic filler (component (D)) is silica; when the non-volatile content in the photosensitive resin composition is set to 100 mass%, the content of the silica is 35 mass% or more; when the total number of phenolic hydroxyl groups and (meth)acrylate groups of (meth)acrylate-modified phenolic resin of the (meth)acrylate-modified phenolic resin (component (B)) is set to 100%, the percentage of the (meth)acrylate groups is 5 to 30%; and the silica comprises a silica having an average particle diameter of 0.01 μm to 0.15 μm.SELECTED DRAWING: None
【課題】ビア底部のアンダーカットを生じさせずに、小径ビアが形成できる感光性樹脂組成物を提供する。【解決手段】成分(A)エポキシ樹脂、成分(B)(メタ)アクリレート変性フェノール樹脂、成分(C)光重合開始剤、及び成分(D)無機充填材を含有する感光性樹脂組成物であって、成分(A)エポキシ樹脂は、数平均分子量が1000以下のエポキシ樹脂を含み、成分(D)無機充填材がシリカであって、前記感光性樹脂組成物中の不揮発成分を100質量%とした場合、前記シリカの含有量が35質量%以上であり、成分(B)(メタ)アクリレート変性フェノール樹脂の(メタ)アクリレート変性フェノール樹脂のフェノール性水酸基と(メタ)アクリレート基との合計数を100%とした場合の(メタ)アクリレート基の比率が5〜30%であり、シリカが、平均粒径が0.01μm〜0.15μmのシリカを含む、感光性樹脂組成物。【選択図】なし |
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Bibliography: | Application Number: JP20200092999 |