POLYIMIDE PRECURSOR SOLUTION

• Main Authors: ECHIGO YOSHIAKI, SUGIMOTO YOSUKE, YOSHIDA TAKESHI, SHIGETA AKIRA, YAMADA HIROKI
• Format: Patent
• Language: English; Japanese
• Published: 24.09.2020
• Subjects: CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; ELECTROGRAPHY; ELECTROPHOTOGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MAGNETOGRAPHY; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; PHOTOGRAPHY; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

To provide (1) a high-concentration polyimide precursor solution that is substantially free of amide-based solvent such as N-methyl-2-pyrrolidone (NMP) and the like, and (2) a PI precursor solution that does not cause powderization of the coat during heating treatment and can be made into a crystalline PI film even for a PI precursor solution containing a salt of only a symmetric s-BPDE and an ODA.SOLUTION: A polyimide precursor solution characterized by the following. 1) The solute comprises a salt of a 3,3',4,4'-biphenyltetracarboxylic acid diester (s-BPAE) and/or a 2,3,3',4'-biphenyltetracarboxylic acid diester (a-BPAE), and a 4,4'- Oxydianiline (ODA). 2) The solvent is substantially free of amide-based solvent.SELECTED DRAWING: None 【課題】（１）Ｎ−メチル−２−ピロリドン（ＮＭＰ）等のアミド系溶媒を実質的に含有しない、高濃度のポリイミド前駆体溶液を提供する。（２）対称性のｓ−ＢＰＤＥのみとＯＤＡとの塩を含むＰＩ前駆体溶液であっても、加熱処理中に被膜が粉化することがなく、結晶性のＰＩフィルムとすることができるＰＩ前駆体溶液を提供する。【解決手段】以下を特徴とするポリイミド前駆体溶液。１）溶質が、３，３′，４，４′−ビフェニルテトラカルボン酸ジエステル（ｓ−ＢＰＡＥ）および／または２，３，３′，４′−ビフェニルテトラカルボン酸ジエステル（ａ−ＢＰＡＥ）と、４，４′−オキシジアニリン（ＯＤＡ）との塩からなる。２）溶媒が、アミド系溶媒を実質的に含有しない。【選択図】なし