MULTI-CHARGED PARTICLE BEAM DRAWING APPARATUS AND MULTI-CHARGED PARTICLE BEAM BLANKING METHOD

• Main Author: NAKAYAMA TAKAHITO
• Format: Patent
• Language: English; Japanese
• Published: 27.08.2020
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

To extend the life of a blanking plate.SOLUTION: A multi-charged particle beam drawing apparatus includes an emission portion for emitting a charged particle beam, a shaping aperture member in which a plurality of first apertures are formed and a part of a charged particle beam passes through each of the plurality of first apertures to form a multi-beam, a beam stop deflector that is arranged between the emission portion and the shaping aperture member and controls ON/OFF of the charged particle beam, and a beam stop aperture member that is arranged between the beam stop deflector and the shaping aperture member, is provided with an aperture, and blocks a charged particle beam which is controlled to be in a beam ON state by the beam stop deflector, passed through a third aperture, applied to the shaping aperture member, deflected to be in a beam OFF state by the beam stop deflector and positionally displaced from the third aperture.SELECTED DRAWING: Figure 1 【課題】ブランキングプレートの寿命を延ばす。【解決手段】マルチ荷電粒子ビーム描画装置は、荷電粒子ビームを放出する放出部と、複数の第１開口が形成され、複数の第１開口を荷電粒子ビームの一部がそれぞれ通過することによりマルチビームを形成する成形アパーチャ部材と、放出部と成形アパーチャ部材との間に配置され、荷電粒子ビームのＯＮ／ＯＦＦ制御を行うビーム停止用偏向器と、ビーム停止用偏向器と成形アパーチャ部材との間に配置され、開口が設けられており、ビーム停止用偏向器によりビームＯＮの状態になるように制御された荷電粒子ビームが第３開口を通過して成形アパーチャ部材に照射され、ビーム停止用偏向器によりビームＯＦＦの状態になるように偏向されて第３開口から位置が外れた荷電粒子ビームを遮蔽するビーム停止用アパーチャ部材と、を備える。【選択図】図１