COMBINED GALLIUM FOCUSED ION BEAM AND ION MICROSCOPE

To provide a device that forms a cross section by processing with an ion beam and observes the cross section with an ion microscope instead of a device that forms a cross section by processing a sample with an ion beam and observes the cross section with an electron microscope.SOLUTION: An ion beam...

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Main Authors SHICHI HIROYASU, MATSUBARA SHINICHI, HASHIZUME TOMIHIRO, TOMIMATSU SATOSHI, OSHIMA TAKU, ISHITANI TORU
Format Patent
LanguageEnglish
Japanese
Published 27.08.2020
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:To provide a device that forms a cross section by processing with an ion beam and observes the cross section with an ion microscope instead of a device that forms a cross section by processing a sample with an ion beam and observes the cross section with an electron microscope.SOLUTION: An ion beam processing device combined with an ion beam microscope includes a liquid metal ion source for emitting gallium, a condenser lens, an objective lens, an ion beam scanning deflector, a stencil mask, and a processing ion beam irradiation system column 206 for storing these units, and an ion beam irradiation axis 1003 of the ion microscope is substantially perpendicular to the installation surface of the device, and the ion beam irradiation axis 1005 of gallium-focused ion beam is arranged in an inclined direction with respect to the installation surface of the device.SELECTED DRAWING: Figure 12B 【課題】試料をイオンビームにより加工して断面を形成して，断面を電子顕微鏡で観察する装置に替わり，イオンビームにより加工して断面を形成して，断面をイオン顕微鏡で観察する装置を提供する。【解決手段】イオンビーム顕微鏡と複合するイオンビーム加工装置は、ガリウムを放出する液体金属イオン源、コンデンサレンズ、対物レンズ、イオンビーム走査偏向器、ステンシルマスク、及びこれらを格納する加工用イオンビーム照射系カラム２０６などから構成され、イオン顕微鏡のイオンビーム照射軸１００３が，装置の設置面に対して概略垂直であり、ガリウム集束イオンビームのイオンビーム照射軸１００５が装置の設置面に対して傾斜方向に配置される。【選択図】図１２Ｂ
Bibliography:Application Number: JP20200075980