FILM DEPOSITION APPARATUS

• Main Authors: SUZUKI TETSUYA, NAKAMORI HIDEKI, TSUBOI HITOMI, HIRATSUKA MASANORI
• Format: Patent
• Language: English; Japanese
• Published: 06.08.2020
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To provide a film deposition apparatus capable of securely depositing a film on a workpiece even in a state in which an initial degree of vacuum in a chamber is made relatively low.SOLUTION: A film deposition apparatus comprises, in a chamber into which a medium gas for discharge generation is introduced, an electrode, a substrate arranged opposite the electrode, a magnetic field generation part, and a holding part holding a workpiece. The film deposition apparatus further comprises a power supply for electrode which applies an electrode voltage to the electrode, a power supply for substrate which applies a substrate voltage to the substrate, and a power supply control part which controls the power supply for electrode and the power supply for substrate to control an electric field generated between the electrode and substrate. The magnetic field generation part is so arranged that lines of magnetic force of a generated magnetic field overlap with lines of electric force based upon the electric field. The workpiece is arranged on lines of magnetic force, the medium gas introduced into the chamber is made into plasma on the basis of the electric field generated between the electrode and substrate, and ions generated as a result are guided onto the workpiece through the operation of the magnetic field to form a carbon film on a surface of the workpiece.SELECTED DRAWING: Figure 1 【課題】チャンバ内の初期真空度を比較的低くした状態においても、被加工材への成膜を確実に行うことができる成膜装置を提供する。【解決手段】放電発生用の媒体ガスが導入されるチャンバ内に、電極と、電極に対向して配置された基板と、磁界発生部と、被加工材を保持する保持部とを備え、さらに、電極に対して電極電圧を印加する電極用電源と、基板に対して基板電圧を印加する基板用電源と、電極用電源と基板用電源を制御して、電極と基板との間に生じる電界を制御する電源制御部とを備え、磁界発生部は、発生する磁界の磁力線が電界に基づく電気力線に重なるように配置され、被加工材は磁力線上に配置され、チャンバ内に導入された媒体ガスは、電極と基板との間に生じた電界に基づいてプラズマ化され、これによって生じたイオンが磁界の作用によって被加工材上へ誘導され、被加工材の表面に炭素膜が形成される。【選択図】図１