FOREIGN SUBSTANCE REMOVING DEVICE, SUBSTRATE CLEANING DEVICE, SUBSTRATE PROCESSING DEVICE, AND CLEANING MEMBER

• Main Authors: DAIHO TADASHI, TAKATO CHIKAKO, HIYAMA HIROKUNI, WADA TAKETAKA
• Format: Patent
• Language: English; Japanese
• Published: 27.07.2020
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MANUFACTURE OR TREATMENT THEREOF; NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS; NANOTECHNOLOGY; PERFORMING OPERATIONS; SEMICONDUCTOR DEVICES; TRANSPORTING

To provide a foreign substance removing device, a substrate cleaning device, a substrate processing device, and a cleaning member that can effectively remove a minute foreign matter adhering to a workpiece.SOLUTION: A foreign substance removing device 60 that removes a foreign substance adhering to a substrate W includes a nanopillar structure 84 having a plurality of nanosize pillars 85, and an actuator that brings the nanopillar structure 84 and the substrate W into contact or in proximity with each other.SELECTED DRAWING: Figure 7 【課題】ワークに付着した微小の異物を効果的に除去できる異物除去装置、基板洗浄装置、基板処理装置、及び洗浄部材の提供。【解決手段】基板Ｗに付着している異物を除去する異物除去装置６０であって、ナノサイズのピラー８５を複数有するナノピラー構造体８４と、ナノピラー構造体８４と基板Ｗを接触または近接させるアクチュエータと、を有する。【選択図】図７