ELECTROSTATIC CHUCK
To provide an electrostatic chuck capable of suppressing the deposition of particles at a sealing ring portion while effectively controlling the pressure of gas in each region.SOLUTION: An electrostatic chuck includes: a base plate; and a ceramic dielectric substrate 11 which is provided on the base...
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Format | Patent |
Language | English Japanese |
Published |
02.07.2020
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Abstract | To provide an electrostatic chuck capable of suppressing the deposition of particles at a sealing ring portion while effectively controlling the pressure of gas in each region.SOLUTION: An electrostatic chuck includes: a base plate; and a ceramic dielectric substrate 11 which is provided on the base plate, and has a first major surface 11a exposed externally. The first major surface includes at least a first region 101 and a second region 102 adjacent to the first region. In the first region, there are provided: a first boundary groove 14a which is provided to be proximal to a first boundary between the first region and the second region and extends along the first boundary; and at least one first gas introduction hole 15 connected to the first boundary groove. In the second region, there are provided: a second boundary groove 14a which is provided to be proximal to the first boundary and extends along the first boundary; and at least one second gas introduction hole 15 connected to the second boundary groove.SELECTED DRAWING: Figure 2
【課題】各領域におけるガスの圧力を効果的に制御しつつ、シールリング部分におけるパーティクルの堆積を抑制することができる静電チャックを提供する。【解決手段】静電チャックは、ベースプレートと、ベースプレートの上に設けられ、外部に露出する第1主面11aを有するセラミック誘電体基板11とを備える。第1主面は、少なくとも第1領域101と、第1領域に隣接する第2領域102とを含む。第1領域には、第1領域と第2領域との間の第1境界に近接して設けられ、第1境界に沿って延びる第1境界溝14aと、第1境界溝に接続された少なくとも1つの第1ガス導入孔15と、が設けられる。第2領域には、第1境界に近接して設けられ、第1境界に沿って延びる第2境界溝14aと、第2境界溝に接続された少なくとも1つの第2ガス導入孔15と、が設けられる。【選択図】図2 |
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AbstractList | To provide an electrostatic chuck capable of suppressing the deposition of particles at a sealing ring portion while effectively controlling the pressure of gas in each region.SOLUTION: An electrostatic chuck includes: a base plate; and a ceramic dielectric substrate 11 which is provided on the base plate, and has a first major surface 11a exposed externally. The first major surface includes at least a first region 101 and a second region 102 adjacent to the first region. In the first region, there are provided: a first boundary groove 14a which is provided to be proximal to a first boundary between the first region and the second region and extends along the first boundary; and at least one first gas introduction hole 15 connected to the first boundary groove. In the second region, there are provided: a second boundary groove 14a which is provided to be proximal to the first boundary and extends along the first boundary; and at least one second gas introduction hole 15 connected to the second boundary groove.SELECTED DRAWING: Figure 2
【課題】各領域におけるガスの圧力を効果的に制御しつつ、シールリング部分におけるパーティクルの堆積を抑制することができる静電チャックを提供する。【解決手段】静電チャックは、ベースプレートと、ベースプレートの上に設けられ、外部に露出する第1主面11aを有するセラミック誘電体基板11とを備える。第1主面は、少なくとも第1領域101と、第1領域に隣接する第2領域102とを含む。第1領域には、第1領域と第2領域との間の第1境界に近接して設けられ、第1境界に沿って延びる第1境界溝14aと、第1境界溝に接続された少なくとも1つの第1ガス導入孔15と、が設けられる。第2領域には、第1境界に近接して設けられ、第1境界に沿って延びる第2境界溝14aと、第2境界溝に接続された少なくとも1つの第2ガス導入孔15と、が設けられる。【選択図】図2 |
Author | IKEGUCHI MASAFUMI ITOYAMA TETSURO SAIGAN SHUICHIRO SHIRAISHI JUN |
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SubjectTerms | BASIC ELECTRIC ELEMENTS CONVERSION OR DISTRIBUTION OF ELECTRIC POWER ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERATION SEMICONDUCTOR DEVICES |
Title | ELECTROSTATIC CHUCK |
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