ELECTROSTATIC CHUCK

• Main Authors: IKEGUCHI MASAFUMI, SHIRAISHI JUN, ITOYAMA TETSURO, SAIGAN SHUICHIRO
• Format: Patent
• Language: English; Japanese
• Published: 02.07.2020
• Subjects: BASIC ELECTRIC ELEMENTS; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER; ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERATION; SEMICONDUCTOR DEVICES

To provide an electrostatic chuck capable of suppressing the deposition of particles at a sealing ring portion while effectively controlling the pressure of gas in each region.SOLUTION: An electrostatic chuck includes: a base plate; and a ceramic dielectric substrate 11 which is provided on the base plate, and has a first major surface 11a exposed externally. The first major surface includes at least a first region 101 and a second region 102 adjacent to the first region. In the first region, there are provided: a first boundary groove 14a which is provided to be proximal to a first boundary between the first region and the second region and extends along the first boundary; and at least one first gas introduction hole 15 connected to the first boundary groove. In the second region, there are provided: a second boundary groove 14a which is provided to be proximal to the first boundary and extends along the first boundary; and at least one second gas introduction hole 15 connected to the second boundary groove.SELECTED DRAWING: Figure 2 【課題】各領域におけるガスの圧力を効果的に制御しつつ、シールリング部分におけるパーティクルの堆積を抑制することができる静電チャックを提供する。【解決手段】静電チャックは、ベースプレートと、ベースプレートの上に設けられ、外部に露出する第１主面１１ａを有するセラミック誘電体基板１１とを備える。第１主面は、少なくとも第１領域１０１と、第１領域に隣接する第２領域１０２とを含む。第１領域には、第１領域と第２領域との間の第１境界に近接して設けられ、第１境界に沿って延びる第１境界溝１４ａと、第１境界溝に接続された少なくとも１つの第１ガス導入孔１５と、が設けられる。第２領域には、第１境界に近接して設けられ、第１境界に沿って延びる第２境界溝１４ａと、第２境界溝に接続された少なくとも１つの第２ガス導入孔１５と、が設けられる。【選択図】図２